1.

Conference Proceedings
Conference Proceedings
1. Sensitivity of the surface charge profiler (SCP) method for some monitoring applications
Danel, A. ; Lardin, T. ; Kamarinos, G. ; Tardif, F.
Pub. info.: Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II.  pp.394-403,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-22
2.

Conference Proceedings
Conference Proceedings
2. POST W CMP CLEANING
Constant, I. ; Marthon, S. ; Lardin, T. ; David, C. ; Jacquemond, M.N. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.626-633,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. SILK SURFACE CHEMICAL TREATMENT
Beverina, A. ; Maisonobe, J. C. ; Lardin, T. ; Ermolieff, A. ; Passemard, G. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.320-326,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
4.

Conference Proceedings
Conference Proceedings
4. OPTIMIZATION OF DILUTE SC1
Boelen, P. ; Lardin, T. ; Sandrier, B. ; Matthews, R. ; Kashkoush, I. ; Novak, R. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.161-167,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
5.

Conference Proceedings
Conference Proceedings
5. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.114-122,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-15
6.

Conference Proceedings
Conference Proceedings
6. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.85-93,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
7.

Conference Proceedings
Conference Proceedings
7. OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE
Tardif, F. ; Lardin, T. ; Paillet, C. ; Joly, J.P. ; Fleury, A. ; Patruno, P. ; Levy, D. ; Barla, K.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.49-59,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20