1.

Conference Proceedings
Conference Proceedings
1. A new approach to preparation of standard LEDs for luminous intensity and flux measurement of LEDs (Invited Paper) [6355-17]
Park, S.-N. ; Park, S. ; Lee, D.-H.
Pub. info.: Advanced LEDs for solid state lighting : 5-7 September 2006, Gwangju, South Korea.  pp.63550G-,  2006.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6355
2.

Conference Proceedings
Conference Proceedings
2. Formation and Properties of Co-Suicide by Using Col-x Tax Alloy
Kim, M.-J. ; Lee, D.-H. ; Ko, D.-H. ; Ku, J.-H. ; Choi, S. ; Fujihara, K. ; Kang, H.-K. ; Oh, S-H. ; Park, C.-G. ; Lee, H.-J.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.571-580,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-2
3.

Conference Proceedings
Conference Proceedings
3. Nanocrystals Formation and Microstructure Evolution of Amorphous Si and Si0 7Ge0.3 by Using Low Pressure Chemical Vapor Deposition
Yoon, T.-S. ; Lee, D.-H. ; Koon, J.-K. ; Kim, K.B.
Pub. info.: CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition.  pp.419-426,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-13
4.

Conference Proceedings
Conference Proceedings
4. Implementation of a new LCD polarized stereoscopic projection system with improved light efficiency [5962-114]
Kim, S.-C. ; Lee, D.-H. ; Kim, E.-S.
Pub. info.: Optical Design and Engineering II.  pp.596238-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5962
5.

Conference Proceedings
Conference Proceedings
5. Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248-nm chemically amplified resist
Chung, Y.-S. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.-Y.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.660-670,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
6.

Conference Proceedings
Conference Proceedings
6. Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248-nm chemically amplified resist
Kim, H.-J. ; Chung, Y.-S. ; Lee, D.-H. ; Cho, S.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.Y.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.651-659,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
7.

Conference Proceedings
Conference Proceedings
7. Evaluation of EA-PSM opaque repair on 90-nm lithography
Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.484-495,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
8.

Conference Proceedings
Conference Proceedings
8. Detection capability for chrome defect of tri-tone PSM
Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.439-445,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
9.

Conference Proceedings
Conference Proceedings
9. Debris-free EUV source using a through-hole tin target
Ueno, Y. ; Aota, T. ; Niimi, G. ; Lee, D.-H. ; Nishigori, K. ; Yashiro, H. ; Tomie, T.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.750-758,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
10.

Conference Proceedings
Conference Proceedings
10. Preserving EAPSM phase and transmission in the clean process
Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.713-724,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
11.

Conference Proceedings
Conference Proceedings
11. Comparative evaluation of mask production CAR development processes with stepwise defect inspection
Jeong, W.-G. ; Lee, J.-K. ; Park, D.I. ; Park, E.-S. ; Lee, J.-H. ; Seo, S.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.626-633,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
12.

Conference Proceedings
Conference Proceedings
12. Holographic full-color 3D display system using color-LCoS spatial light modulator
Kim, S.-C. ; Moon, J.-W. ; Lee, D.-H. ; Son, K.-C. ; Kim, E.-S.
Pub. info.: Practical Holography XIX: Materials and Applications.  pp.223-233,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5742
13.

Conference Proceedings
Conference Proceedings
13. Impact of mask defect in a high MEEF process
Jeong, C.-Y. ; Park, K.-Y. ; Choi, J.S. ; Lee, J.G. ; Lee, D.-H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1067-1078,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
14.

Conference Proceedings
Conference Proceedings
14. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)
Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.332-340,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
15.

Conference Proceedings
Conference Proceedings
15. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.303-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
16.

Conference Proceedings
Conference Proceedings
16. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process
Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.597-605,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
17.

Conference Proceedings
Conference Proceedings
17. The judgment criteria of halftone pinhole defects
Shin, K.M. ; Kim, D.-W. ; Lee, J.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.330-341,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
18.

Conference Proceedings
Conference Proceedings
18. Backup path resource share mechanism using SDLG in optical networks [6354-63]
Park, H. ; Yae, B.-H. ; Lee, D.-H. ; Kim, S.-H.
Pub. info.: Network Architectures, Management, and Applications IV.  pp.63541N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6354
19.

Conference Proceedings
Conference Proceedings
19. Effects of quencher ability on profile in chemically amplified resist system
Kim, D. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yoo, M.-J. ; Lee, S.-H. ; Kim, J. ; Kim, J.-S. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1086-1097,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
20.

Conference Proceedings
Conference Proceedings
20. Characterization of resist flow process for the improvement of contact hole CD uniformity
Koh, C.-W. ; Lee, D.-H. ; Kim, M.-S. ; Park, S.-N. ; Kwon, W.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1382-1389,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
21.

Conference Proceedings
Conference Proceedings
21. Optimization of align marks and overlay targets in VIA first dual damascene process
Shin, D.-U. ; Jeong, Y.-B. ; Park, J.-L. ; Choi, J.-S. ; Lee, J.-G. ; Lee, D.-H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.415-427,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
22.

Conference Proceedings
Conference Proceedings
22. CD-SEM calibration with TEM to reduce CD measurement error
Jeong, C.-Y. ; Lee, J. ; Park, K.-Y. ; Lee, W.G. ; Lee, D.-H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.747-755,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
23.

Conference Proceedings
Conference Proceedings
23. Measurement of area effect by the color panel size
Lee, J.-S. ; Kim, C.-S. ; Yim, O.Y. ; Lee, D.-H.
Pub. info.: 9th Congress of the International Colour Association.  pp.158-161,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4421