I. B. Tutar ; S. Narayanan ; H. Lenz ; R. Nurani ; P. Orio ; P. S. Cho ; K. Wallner ; Y. Kim
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Medical imaging 2007, Visualization and image-guided procedures : 18-20 February 2007, San Diego, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Three-dimensional TV, video, and display V : 3-4 October, 2006, Boston, Massachusetts, USA. 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Three-dimensional TV, video, and display V : 3-4 October, 2006, Boston, Massachusetts, USA. 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Proceedings of the workshop, POLinSAR : applications of SAR polarimetry and polarimetric interferometry, 14-16 January 2003, Frascati, Italy. 2003. Noordwijk, The Netherlands. ESA Publications Division
S. Jayaram ; H. Joshi ; U. Jayaram ; Y. Kim ; H. Kate ; L. Varoz
Pub. info.:
Proceedings of the ASME International Design Engineering Technical Conferences and Computers and Information in Engineering Conferences : 26th Computers and Information in Engineering Conference. 3 pp.921-932, 2006. New York, N.Y.. American Society of Mechanical Engineers
State-of-the-art program on compound semiconductors 45 (SOTAPOCS 45) and wide bandgap semiconductor materials and devices 7. pp.75-86, 2006. Pennington, N.J. Electrochemical Society
Eco-materials processing and design VIII : ISEPD-8, proceedings of the 8th International Symposium on Eco-Materials Processing and Design, January 11-13, 2007, Kitakyushu, Japan. pp.139-142, 2007. Stafa-Zuerich, Switzerland. Trans Tech Publications
C. Lim ; Y. Kim ; A. Hou ; J. Gutt ; S. Marcus ; C. Pomarede ; E. Shero ; H. de Waard ; C. Werkhoven ; L. Chen ; J. Tamim ; N. Chaudhary ; G. Bersuker ; J. Barnett ; C. Young ; P. Zeitzoff ; G. A. Brown ; M. Gardner ; R. W. Murto ; H. R. Huff
Pub. info.:
Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.83-92, 2002. Pennington, NJ. Electrochemical Society
H. Iwai ; S. Ohmi ; S. Akama ; C. Ohshima ; I. Kashiwagi ; A. Kikuchi ; J. Taguchi ; H. Yamamoto ; I. Ueda ; A. Kuriyama ; J. Tonotani ; Y. Kim ; Y. Yoshihara ; H. Ishiwara
Pub. info.:
Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.27-40, 2002. Pennington, NJ. Electrochemical Society
J. C. Lee ; R. Choi ; K. Onishi ; N. Cho ; C. Kang ; Y. Kim ; S. Krishnan
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Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.171-178, 2002. Pennington, NJ. Electrochemical Society
S. Chopra ; Z. Ye ; A. Zojaji ; Y. Kim ; S. Kuppurao
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.307-312, 2008. Pennington, N.J.. Electrochemical Society
Proceedings of the ALOS PI 2008 Symposium, 3-7 November 2008, Island of Rhodes, Greece. 2009. Noordwijk, The Netherlands. ESA Communication Production Office
P.-S. Lam ; Y. J. Chao ; X.-K. Zhu ; Y. Kim ; R. L. Sindelar
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Computational weld mechanics, constraint, and weld fracture : presented at the 2002 ASME Pressure Vessels and Piping Conference, Vancouver, British Columbia, Canada, August 5-9, 2002. pp.133-142, 2002. New York, N.Y.. American Society of Mechanical Engineers
Title of ser.:
Proceedings of the ASME Pressure Vessels and Piping Division
Y. Kim ; Y. J. Chao ; M. J. Pechersky ; M. J. Morgan
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Application of fracture mechanics in failure assessment--2003 : presented at the 2003 ASME Pressure Vessels and Piping Conference : Cleveland, Ohio, July 20-24, 2003. pp.73-80, 2003. New York, N.Y.. American Society of Mechanical Engineers
Title of ser.:
Proceedings of the ASME Pressure Vessels and Piping Division
New developments and application in chemical reaction engineering : proceedings of the 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE '05) : Gyeongju, Korea, June 12-15, 2005. pp.149-152, 2006. Amsterdam. Elsevier
C. Choi ; M. Jang ; Y. Kim ; M. Jeon ; S. Lee ; H. Yang ; R. Jung ; M Chang ; H. Hwang
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.295-302, 2007. Pennington, NJ. Electrochemical Society
Y. Kim ; Z. Ye ; A. Lam ; A. Zojaji ; Y. Cho ; S. Kuppurao
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.409-418, 2007. Pennington, NJ. Electrochemical Society
S. Mertens ; Y. Cho ; F. Nouri ; R. Schreutelkamp ; Y. Kim ; P. Verheyen ; J. Steenbergen ; C. Vrancken ; H. Bender ; O. Richard ; B. Van Daele ; W. Vandervorst ; P. Absil ; S. Kubicek ; C. Demeurisse ; Z. Tokei ; A. Lauwers ; L. Geenen
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.139-148, 2006. Pennington, NJ. Electrochemical Society
S. Guha ; V. Narayanan ; V. Paruchuri ; B. Linder ; M. Copel ; N. Bojarczuk ; Y. Kim ; M. Chudzik ; Y. Wang ; P. Ronsheim
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.247-252, 2006. Pennington, NJ. Electrochemical Society