1.

Conference Proceedings
Conference Proceedings
1. 193-nm lithography on a full-field scanner
Goethals,A.-M. ; Pollers,I. ; Jaenen,P. ; Roey,F.Van ; Ronse,K. ; Heskamp,B. ; Davies,G.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.278-289,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Feasibility of printing 0.1-ｦﾌm technology with optical lithography
Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Flagello,D.G. ; Geh,B. ; Kaiser,W.M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.347-357,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques
Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.228-238,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Intrawafer CD control in state-of-the-art lithography
Pollentier,I.K. ; Baerts,C. ; Marschner,T. ; Ronse,K. ; Grozev,G. ; Reybrouck,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.882-892,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Reduction of mask-induced CD errors by optical proximity correction
Randall,J. ; Tritchkov,A. ; Jonckheere,R. ; Jaenen,P. ; Ronse,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.124-130,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
6.

Conference Proceedings
Conference Proceedings
6. CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing
Ronse,K. ; Maenhoudt,M. ; Marschner,T. ; Van,den,hove,L. ; Streefkerk,B. ; Finders,J. ; van,Schoot,J. ; Luehrmann,P.F. ; Minvielle,A.M.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.56-66,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
7.

Conference Proceedings
Conference Proceedings
7. Recent trends and progress in deep-UV lithography
Ronse,K. ; Goethals,A.M. ; Vandenberghe,G. ; Maenhoudt,M.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.34-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
8.

Conference Proceedings
Conference Proceedings
8. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
9.

Conference Proceedings
Conference Proceedings
9. Automated OPC for application in advanced lithography(Invited Paper)
Ronse,K. ; Tritchkov,A. ; Randall,J. ; Jonckheere,R. ; Ghandehari,K. ; Van den hove,L.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.138-144,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
10.

Conference Proceedings
Conference Proceedings
10. Variable-threshold resist models for lithography simulation
Randall,J. ; Ronse,K. ; Marschner,T. ; Goethals,M. ; Ercken,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.176-182,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
11.

Conference Proceedings
Conference Proceedings
11. Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond
Op,de,Beeck,M. ; Vandenberghe,G. ; Jaenen,P. ; Zhang,F.-H. ; Delvaux,C. ; Richardson,P. ; van,Puyenbroeck,I. ; Ronse,K. ; Lamb,III,J.E. ; van,der,Hilst,J.B.C. ; van,Wingerden,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.322-336,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
12.

Conference Proceedings
Conference Proceedings
12. Characterization and optimization of CD control for 0.25-ｦﾌm CMOS applications
Ronse,K. ; Beeck,M.Opde ; Yen,A. ; Kim,K.-H. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.555-563,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
13.

Conference Proceedings
Conference Proceedings
13. Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography
Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.726-738,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
14.

Conference Proceedings
Conference Proceedings
14. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels
Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.320-332,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
15.

Conference Proceedings
Conference Proceedings
15. Optical proximity effects and correction strategies for chemical-amplified DUV resists
Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.622-633,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
16.

Conference Proceedings
Conference Proceedings
16. New approach to optical proximity correction
Rosenbusch,A. ; Juffermans,A.H. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Watson,J.C. ; Ziegler,W. ; Zimmermann,R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.585-593,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
17.

Conference Proceedings
Conference Proceedings
17. Some challenges for mask making to keep up with the roadmap
Jonckheere,R. ; Randall,J.N. ; Marschner,T. ; Ronse,K.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.313-324,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
18.

Conference Proceedings
Conference Proceedings
18. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726