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Conference Proceedings

1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.391-398, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

2. EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING

Vereecke, G. ; Holsteyns, F. ; Veltens, J. ; Lux, M. ; Amauts, S. ; Kenis, K. ; Vos, R. ; Mertens, P. ; Heyns, M.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

3. MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING

Xu, K. ; Vos, R. ; Vereecke, G. ; Mertens, P. ; Heyns, M. ; Vinckier, C. ; Fransaer, J.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.137-144, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

4. CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS

Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.569-578, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

5. QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1

Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.176-183, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

6. ADVANCED SINGLE CHEMISTRY ALKALINE CLEANING IN A SINGLE TANK TOOL

Onsia, B. ; Schellkes, E. ; Vos, R. ; De Gendt, S. ; Doll, O. ; Fester, A. ; Kolbesen, B. ; Hoffman, M. ; Hatcher, Z. ; Wolke, K. ; Mertens, P. ; Heyns, M.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.23-30, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

Conference Proceedings

7. OPTIMIZATION OF A BRUSH SCRUBBER FOR NANO-SIZED PARTICLES

Xu, K. ; Vos, R. ; Arnauts, S. ; Lux, M. ; Schaetzlein, W. ; Speh, U. ; Mertens, P. ; Heyns, M. ; Vinckier, C.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.187-194, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

Conference Proceedings

8. REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING

Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.91-101, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

Conference Proceedings

9. SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz

Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.147-155, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

10.

Conference Proceedings

10. MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS

Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.

Pub. info.:	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.176-185, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-7

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