1.

Conference Proceedings
Conference Proceedings
1. QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION
Lucovsky, G. ; Ma, Y. ; He, S.S. ; Yasuda, T. ; Stephens, D.J. ; Habermehl, S.
Pub. info.: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.33-38,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 284
2.

Conference Proceedings
Conference Proceedings
2. ELECTRICAL PROPERTIES OF OXIDE-NITRIDE-OXIDE, ONO, HETEROSTRUCTURES FABRICATED BY LOW TEMPERATURE REMOTE PECVD
Ma, Y. ; Yasuda, T. ; Chen, Y.L. ; Lucovsky, G. ; Maher, D.M.
Pub. info.: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.147-152,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 284
3.

Conference Proceedings
Conference Proceedings
3. Si-N BONDING AT THE SiO2/Si INTERFACES DURING DEPOSITION OF SiO2 BY THE REMOTE PECVD PROCESS
Ma, Y. ; Yasuda, T. ; Habermehl, S. ; Lucovsky, G.
Pub. info.: Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A..  pp.341-348,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 236
4.

Conference Proceedings
Conference Proceedings
4. Non-Contact Characterization of Ultrathin Dielectrics for the Gigabit Era
Roy, P.K. ; Chacon, C. ; Ma, Y. ; Kizilyalli, I.C. ; Horner, O.S. ; Verkuil, R.L. ; Miller, T.G.
Pub. info.: Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.280-294,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-12
5.

Conference Proceedings
Conference Proceedings
5. Thermal Stability of Organic Interlayer with Low Dielectric Constant
Hara, T. ; Takasoh, J. ; Yang, H. ; Tweet, D.J. ; Nguyen, T. ; Ma, Y. ; Evans, D.R. ; Hsu, S.T.
Pub. info.: Dielectric material integration for microelectronics.  pp.79-87,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-3
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Conference Proceedings
Conference Proceedings
6. The Partial Oxidation of Methane to Synthesis Gas by Oxygen Selective Dense Perovskite Membrane Reactors
Ma, Y. ; Tsia, C. ; Moser, W. ; Dixon, A.
Pub. info.: AIChE NATIONAL MEETING - MARCH 9-13, 1997 - HOUSTON, TX.  1997.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1997
7.

Conference Proceedings
Conference Proceedings
7. CHEMICALLY MODIFIED SECOND HARMONIC GENERATION AT SURFACES ON VICINAL Si(111) WAFERS
Emmerichs, U. ; Meyer, C. ; Leo, K. ; Kurz, H. ; Bjorkman, C.H. ; Shearon, Jr., C.E. ; Ma, Y. ; Yasuda, T. ; Lucovsky, G.
Pub. info.: Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.815-820,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 281
8.

Conference Proceedings
Conference Proceedings
8. Si(100) SURFACE PREPARATION BY IN-SITU OR IN-VACUO EXPOSURE TO REMOTELY PLASMA-GENERATED ATOMIC HYDROGEN: APPLICATIONS TO DEPOSITED SiO2 AND EPITAXIAL GROWTH OF Si
Yasuda, T. ; Ma, Y. ; Habermehl, S. ; Kim, S.S. ; Lucovsky, G. ; Schneider, T.P. ; Cho, J. ; Nemanich R.J.
Pub. info.: Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A..  pp.395-400,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 202
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Conference Proceedings
Conference Proceedings
9. COMPARISON OF TRAPPING STATES AT SiQ2/473Si INTERFACES ON Si(100), (110), AND (111) PREPARED BY PLASMA-ASSISTED OXIDATION AND OXIDE DEPOSITION, AND BY EXPOSURE TO ATOMIC H PRIOR TO OXIDATION AND DEPOSITION
Yasuda, T. ; Ma, Y. ; Habermechl, S. ; Lucovsky, G.
Pub. info.: Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A..  pp.473-480,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 262
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Conference Proceedings
Conference Proceedings
10. A NEW TWO-STEP PLASMA-ASSISTED SURFACE CLEANING-OXIDATION AND FILM-DEPOSITION PROCESS SEQUENCE FOR THE FORMATION OF Si(100)/SiO2 INTERFACES WITH LOW DENSITIES OF INTERFACIAL TRAPS
Ma, Y. ; Yasuda, T. ; Habermehl, S. ; He, S.S. ; Stephens, D.J. ; Lucovsky, G.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.69-74,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
11.

Conference Proceedings
Conference Proceedings
11. SURFACE CLEANING PRIOR TO FORMATION OF Si/SiO2 INTERFACES BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD)
Lamb, H.H. ; Kalem, S. ; Bedge, S. ; Yasuda, T. ; Ma, Y. ; Lucovsky, G.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.75-80,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
12.

Conference Proceedings
Conference Proceedings
12. Si-N BONDING AT THE SiO2/Si INTERFACES DURING DEPOSITION OF SiO2 BY THE REMOTE PECVD PROCESS
Ma, Y. ; Yasuda, T. ; Habermehl, S. ; Lucovsky, G.
Pub. info.: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.799-806,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 235
13.

Conference Proceedings
Conference Proceedings
13. Deposition and Treatment of TiO2 as an Alternative for Ultrathin Gate Dielectrics
Ma, Y. ; Ono, Y. ; Hsu, S. T.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.355-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
14.

Conference Proceedings
Conference Proceedings
14. The Use of RHEED Intensities for the Quantitative Characterization of Surfaces
Ma, Y. ; Lordi, S. ; Eades, J. A.
Pub. info.: Evolution of epitaxial structure and morphology : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.3-,  1996.  Pittsburgh, Pennsylvania.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 399
15.

Conference Proceedings
Conference Proceedings
15. CONTROL OF Si-SiO2 INTERFACE PROPERTIES IN MOS DEVICES PREPARED BY PLASMA-ASSISTED AND RAPID THERMAL PROCESSES
Lucovsky, G. ; Yasuda, T. ; Ma, Y. ; Hattangady, S. V. ; Xu, X-L. ; Misra, V. ; Hornung, B. ; Wortman, J. J.
Pub. info.: Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.81-,  1994.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 318
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Conference Proceedings
Conference Proceedings
16. Ultrathin Gate Oxides With Shallow Nitrogen Implants as Effective Barriers to Boron Diffusion
Ono, Y. ; Ma, Y. ; Hsu, S-T.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.39-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
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Conference Proceedings
Conference Proceedings
17. Soft Breakdown in Ultrathin Oxides
Weir, B. E. ; Silverman, P. J. ; Alers, G. B. ; Monroe, D. ; Alam, M. A. ; Sorsch, T. W. ; Green, M. L. ; Timp, G. L. ; Ma, Y. ; Frei, M. ; Liu, C. T. ; Bude, J. D. ; Krisch, K. S.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.301-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
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Conference Proceedings
Conference Proceedings
18. Relationship Between Interfacial Roughness and Dielectric Reliability for Silicon Oxynitride Gate Dielectrics Processed With Nitric Oxide
Sapjeta, J. ; Green, M. L. ; Chang, J. P. ; Silverman, P. J. ; Sorsch, T. W. ; Weir, B. E. ; Gladden, W. ; Ma, Y. ; Sung, C. Y. ; Lennard, W. N.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.289-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
19.

Conference Proceedings
Conference Proceedings
19. Lattice Strains in Gold and Rhenium Under Non-Hydrostatic Compression
Duffy, T. S. ; Shen, G. ; Heinz, D. L. ; Ma, Y. ; Hemley, R. J. ; Mao, H. K. ; Singh, A. K.
Pub. info.: High-pressure materials research : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A..  pp.145-,  1998.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 499
20.

Conference Proceedings
Conference Proceedings
20. A LOW-TEMPERATURE PROCESS FOR DEVICE QUALITY Si/SiO2 INTERFACES ON Si(111)
Yasuda, T. ; Lee, D. R. ; Bjorkman, C. H. ; Ma, Y. ; Lucovsky, G. ; Emmerichs, U. ; Meyer, C. ; Leo, K. ; Kurz, H.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.375-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
21.

Conference Proceedings
Conference Proceedings
21. A Two-Step, Lightly Nitrided Gate Oxidation process for Sub-0.5ｦﾌm CMOS Technology
Roy, P. K. ; Ma, Y. ; Flemming, M. T.
Pub. info.: Materials reliability in microelectronics VI : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.409-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 428
22.

Conference Proceedings
Conference Proceedings
22. CHARACTERIZATION OF NANOSCALE OXIDE AND OXYHYDROXIDE POWDERS USING EXAFS SPECTROSCOPY
Darab, John G. ; Linehan, J. C. ; Ma, Y. ; Matson, D. W.
Pub. info.: Applications of synchrotron radiation techniques to materials science : symposium held April 12-15, 1993, San Francisco, California, U.S.A..  pp.9-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 307
23.

Conference Proceedings
Conference Proceedings
23. SILICON OXYNITRIDE AND OXIDE-NITRIDE-OXIDE GATE DIELECTRICS BY CONBINED PLASMA-RAPID THERMAL PROCESSING
Ma, Y. ; Hattangady, S. V. ; Yasuda, T. ; Niimi, H. ; Gandhi, S. ; Lucovsky, G.
Pub. info.: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.169-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 342
24.

Conference Proceedings
Conference Proceedings
24. Nitrogen-atom bonding at SiO2/Si interfaces in Metal-Insulator-Semiconductor (MIS) stacked gates made by integration of plasma assisted oxidation-deposition and rapid thermal processing
Ma, Y. ; Yasuda, T. ; Lucovsky, G.
Pub. info.: III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A..  pp.569-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 300
25.

Conference Proceedings
Conference Proceedings
25. Synthesis of Ultrathin Stacked Oxides Using Low Pressure Single Furnace Cluster Process
Roy, P. K. ; Brady, D. ; Chetlur, S. ; Ma, Y. ; Morse, K.
Pub. info.: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.89-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 473
26.

Conference Proceedings
Conference Proceedings
26. IN-SITU VAPOR PHASE PROCESSES IN AN INTEGRATED CLUSTER SYSTEM FOR PRE-GATE OXIDE SILICON SURFACE CLEANING
Ma, Y. ; Green, M.L.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.115-125,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20