Ham, Y. M. ; Dillon, B. ; Progler, C. ; Goldammer, K. ; Jin, Z. ; Green, G. ; Mackay, R. S. ; Divecha, H. ; Boksha, V. ; Martin, P. ; Heins, M. ; Zhang, Y. ; Davis, K. ; Marutyan, R. ; Martirosyan, K. ; Bakarian, S.
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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.319-330, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Zhang, Y. ; Gray, R. ; Chou, S. ; Rockwell, B. ; Xiao, G. ; Kamberian, H. ; Cottle, R. ; Wolleben, A. ; Progler, C.
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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.313-318, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kim, Y. D. ; Kang, H. B. ; Zhang, Y. ; Tran, C. ; Farrar, N. ; Qin, J. ; Rockwell, B. ; Cho, H. J. ; Cottle, R. ; Chan, D. ; Martin, P. ; Choi, S. S. ; Progler, C.
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Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1586-1590, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Jhaveri, T. ; Cottle, R. ; Zhang, Y. ; Progler, C.
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Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.274-284, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Zhang, Y. ; Gray, R. ; Nakagawa, O. S. ; Gupta, P. ; Kamberian, H. ; Xiao, G. ; Cottle, R. ; Progler, C.
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Photomask and Next-Generation Lithography Mask Technology XII. pp.614-618, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering