Hartmann, J.M. ; Papon, A.M. ; Holliger, P. ; Rolland, G. ; Billon, T. ; Rouviere, M. ; Vivien, L. ; Laval, S.
Pub. info.:
High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.147-152, 2004. Warrendale, Pa.. Materials Research Society
Allegret, S. ; Rolland, G. ; Guidotti, E. ; Yamasaki, H. ; Holliger, P. ; Pierre, F. ; Martin, F.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.324-330, 2005. Pennington, NJ. Electrochemical Society
Blin, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.233-242, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Bogumilowicz, Y. ; Hartmann, J.M. ; Damlencourt, J.F. ; Vandelle, B. ; Abbadie, A. ; Papon, A.-M. ; Rolland, G. ; Holliger, P. ; Di Nardo, C. ; Besson, P. ; Ernst, T. ; Billon, T. (CEA-LETI)
Pub. info.:
SiGe: materials, processing, and devices : proceedings of the First international symposium. pp.665-680, 2004. Pennington, N.J.. Electrochemical Society
Bun, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.233-242, 2003. Pennington, NJ. Electrochemical Society