1.

Conference Proceedings
Conference Proceedings
1. Ultra-Shallow Junctions by Ion Implantation and Rapid Thermal Annealing: Spike-Anneals, Ramp Rate Effects
Agarwal, A. ; Gossmann, H-J. ; Fiory, A. T.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.19-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568
2.

Conference Proceedings
Conference Proceedings
2. Shallow Boron Implant Activation
Fiory, A. T. ; Bourdelle, K. K. ; Agarwal, A. ; Gossmann, H-J. ; Rafferty, C. S.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.31-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568