1.

Conference Proceedings
Conference Proceedings
1. Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography
Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Ishikawa, T. ; Koh, M. ; Kodani, T. ; Moriya, T. ; Yamashita, T. ; Araki, T. ; Toriumi, M. ; Aoyama, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.159-168,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
Ishikawa, T. ; Kodani, T. ; Koh, M. ; Moriya, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Toriumi, M. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.169-177,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376