1.

Conference Proceedings
Conference Proceedings
1. Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
Kurose, E. ; Watanabe, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.603-614,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)
Kawaguchi, Y. ; Sasaki, T. ; Irisawa, J. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.525-532,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Advances in resist pattern transfer process using 157-nm lithography
Furukawa, T. ; Hagiwara, T. ; Kawaguchi, E. ; Matsunaga, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1064-1073,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Airborne contamination control for 157-nm lithography: influence of ammonia contamination
Matsui, H. ; Kitano, J. ; Yoshihara, K. ; Kawaguchi, E. ; Furukawa, T. ; Matsunaga, K. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1074-1081,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.
Pub. info.: Optical Microlithography XVII.  pp.104-115,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. 157-nm chromeless phase lithography with extremely high numerical aperture
Watanabe, K. ; Hagiwara, T. ; Matsuura, S. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.537-544,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. 157-nm chromeless phase lithography for 45-nm SRAM gate
Suganaga, T. ; Watanabe, K. ; Matsuura, S. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.1616-1626,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Evaluation systems of F2 laser lithography materials
Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Sumitani, A. ; Sasaki, H. ; Higasikawa, I. ; Irie, S. ; Fujii, K. ; Itani, T. ; Nakano, H. ; Hata, H.
Pub. info.: Optical Microlithography XVII.  pp.1606-1615,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Evaluation of outgassing from a fluorinated resist for 157-nm lithography
Irie, S. ; Fujii, K. ; Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Uchino, I. ; Sumitani, A. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.226-237,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
10.

Conference Proceedings
Conference Proceedings
10. 157-nm resist assessment by a full-field scanner
Otoguro, A. ; Irie, S. ; Ishimaru, T. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.245-253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
11.

Conference Proceedings
Conference Proceedings
11. Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography
Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Ishikawa, T. ; Koh, M. ; Kodani, T. ; Moriya, T. ; Yamashita, T. ; Araki, T. ; Toriumi, M. ; Aoyama, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.159-168,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
12.

Conference Proceedings
Conference Proceedings
12. A new monocyclic fluropolymer structure for 157-nm photoresists
Takebe, Y. ; Eda, M. ; Okada, S. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Fujii, K. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.151-158,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
13.

Conference Proceedings
Conference Proceedings
13. The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
Ishikawa, T. ; Kodani, T. ; Koh, M. ; Moriya, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Toriumi, M. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.169-177,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
14.

Conference Proceedings
Conference Proceedings
14. 157-nm single-layer resist based on novel monocyclic fluorinated polymer
Otoguro, A. ; Irie, S. ; Itani, T. ; Fujii, K. ; Takebe, Y. ; Kawaguchi, Y. ; Yokokoji, O.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.186-195,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376