1.

Conference Proceedings
Conference Proceedings
1. Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
Kurose, E. ; Watanabe, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.603-614,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Advances in resist pattern transfer process using 157-nm lithography
Furukawa, T. ; Hagiwara, T. ; Kawaguchi, E. ; Matsunaga, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1064-1073,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.
Pub. info.: Optical Microlithography XVII.  pp.104-115,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. 157-nm chromeless phase lithography with extremely high numerical aperture
Watanabe, K. ; Hagiwara, T. ; Matsuura, S. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.537-544,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. 157-nm chromeless phase lithography for 45-nm SRAM gate
Suganaga, T. ; Watanabe, K. ; Matsuura, S. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.1616-1626,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. 157-nm resist assessment by a full-field scanner
Otoguro, A. ; Irie, S. ; Ishimaru, T. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.245-253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376