1.

Conference Proceedings
Conference Proceedings
1. Novel antireflective structure for metal layer patterning
Choi,S.-S. ; Cha,H.S. ; Kim,J.-S. ; Park,J.M. ; Kim,D.H. ; Lee,K.H. ; Ahn,J. ; Chung,H.B. ; Kim,B.W.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.336-346,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Design of illumination aperture for ArF exposure system with wide exposing latitude
Choi,S.-S. ; Cha,H.S. ; Kim,J.-S. ; Lee,K.H. ; Kim,D.H. ; Chung,H.B. ; Kim,D.Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.792-799,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
Choi,S.-S. ; Jeon,Y.J. ; Kim,J.-S. ; Chung,H.B. ; Lee,S.Y. ; Lee,J.H. ; Yoo,H.J.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.321-331,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723