1.
Conference Proceedings
Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.
Pub. info.:
Emerging Lithographic Technologies X . pp.61511G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
2.
Conference Proceedings
Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X . pp.879-887, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
3.
Conference Proceedings
Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.:
23rd Annual BACUS Symposium on Photomask Technology . pp.871-879, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
4.
Conference Proceedings
Eguchi, H. ; Susa, T. ; Sumida, T. ; Kurosu, T. ; Yoshii, T. ; Yotsui, K. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.:
24th Annual BACUS Symposium on Photomask Technology . pp.935-942, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567