1.

Conference Proceedings
Conference Proceedings
1. Toward a universal resist dissolution model for lithography simulation
Robertson,S.A. ; Mack,C.A. ; Maslow,M.J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.111-122,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Measurement and analysis of reticle and wafer-level contributions to total CD variation
Preil,M.E. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.144-152,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
3.

Conference Proceedings
Conference Proceedings
3. Automatic calibration of lithography simulation parameters
Jug,S. ; Huang,R. ; Byers,J.D. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.380-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
4.

Conference Proceedings
Conference Proceedings
4. Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks
Ma,Z.M. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1522-1532,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. The MEEF shall inherit the Earth
Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.251-258,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Examination of a simplified reaction-diffusion model for post-exposure bake of chemically amplified resists
Smith,M.D. ; Mack,C.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1022-1036,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
7.

Conference Proceedings
Conference Proceedings
7. Understanding molecular-level effects during post-exposure processing
Schmid,G.M. ; Smith,M.D. ; Mack,C.A. ; Singh,V.K. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1037-1047,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
8.

Conference Proceedings
Conference Proceedings
8. Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Smith,M.D. ; Mack,C.A. ; Petersen,J.S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1013-1021,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
9.

Conference Proceedings
Conference Proceedings
9. Lithographic simulation: a review
Mack,C.A.
Pub. info.: Lithographic and Micromachining Techniques for Optical Component Fabrication.  pp.59-72,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4440
10.

Conference Proceedings
Conference Proceedings
10. Electron-beam lithography simulation for mask making: ？. Comparison of 10- and 50-kV GHOST proximity effect correction
Mack,C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.194-203,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409