R. Jia ; Y. Wang ; Z. Wang ; S. Tsai ; J. Dma ; D. Mao ; L. Karuppiah ; L. Chen
Pub. info.:
Copper interconnects, new contact and barrier metallurgies/structures, and low-k interlevel dielectrics III : at the 208th ECS meeting, October 16-21, 2005, Los Angeles, California, USA. pp.125-134, 2006. Pennington, NJ. Electrochemical Society
Optoelectronic devices and integration II : 12-15 November 2007, Beijing, China. pp.68380R-1-68380R-5, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering