1.

Conference Proceedings
Conference Proceedings
1. Re-evaluating simple lambda-based design rules for low-K1 lithography process control
Postnikov,S.V. ; Lucas,K.D. ; Roman,B.J. ; Wimmer,K.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.901-912,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
Sturtevant,J.L. ; Ho,B.C.P. ; Geiszler,V.C. ; Herrick,M.T. ; King,C.F. ; Carter,R.L. ; Roman,B.J. ; Litt,L.C. ; Smith,B. ; Strozewski,K.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.505-512,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Ring-test aberration determination and device lithography correlation
Garza,C.M. ; Conley,W. ; Roman,B.J. ; Schippers,M. ; Foster,J. ; Baselmans,J. ; Cummings,K.D. ; Flagello,D.G.
Pub. info.: Optical Microlithography XIV.  4346  pp.36-44,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346