1.

Conference Proceedings
Conference Proceedings
1. Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
Kobayashi,S. ; Uno,T. ; Yamamoto,K. ; Tanaka,S. ; Kotani,T. ; Inoue,S. ; Higurashi,H. ; Watanabe,S. ; Yano,M. ; Ohki,S. ; Tsunakawa,K.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.614-621,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Measurement of effective source shift using a grating-pinhole mask
Sato,K. ; Tanaka,S. ; Fujisawa,T. ; Inoue,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.99-107,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Practical topography design for alternating phase-shifting mask
Tanaka,S. ; Nakamura,H. ; Kawano,K. ; Inoue,S.
Pub. info.: Optical Microlithography IX.  Part2  pp.473-484,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726