1.

Conference Proceedings
Conference Proceedings
1. Static EUV micro-exposures using the ETS Set-2 optics
Naulleau, P.P. ; Goldberg, K.A. ; Anderson, E.H. ; Bokor, J. ; Harteneck, B.D. ; Jackson, K.H. ; Olynick, D.L. ; Salmassi, F. ; Baker, S.L. ; Mirkarimi, P.B. ; Spiller, E.A. ; Walton, C.C. ; O'Connell, D.J. ; Yan, P.-Y. ; Zhang, G.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.36-46,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Cr and TaN absorber mask etch CD performance study for extreme-ultraviolet lithography
Zhang, G. ; Yan, P.-Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1092-1098,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Lithographic evaluation of the EUV engineering test stand
Lee, S.H. ; Tichenor, D.A. ; Ballard, W.P. ; Bernardez, L.J, II. ; Goldsmith, J.E.M. ; Haney, S.J. ; Jefferson, K.L. ; Johnson, T.A. ; Leung, A.H. ; O'Connell, D.J. ; Replogle, W.C. ; Wronosky, J.B. ; Blaedel, K.L. ; Naulleau, P.P. ; Goldberg, K.A. ; Gullikson, E.M. ; Chapman, H.N. ; Wurm, S. ; Panning, E.M. ; Yan, P.-Y. ; Zhang, G. ; Bjorkholm, J.E. ; Kubiak, G.D. ; Sweeney, D.W. ; Attwood, D.T. ; Gwyn, C.W.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.266-276,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. Ru-capped EUVL ML mask blank performance
Yan, P.-Y. ; Zhang, G. ; Spiller, E. ; Mirkarimi, P.B.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.824-831,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. EUVL mask with Ru ML capping
Yan, P.-Y. ; Zhang, G. ; Chegwidden, S. ; Spiller, E.A. ; Mirkarimi, P.B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1281-1286,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256