1.

Conference Proceedings
Conference Proceedings
1. EUVL mask patterning with blanks from commercial suppliers
Yan, P. -Y. ; Zhang, G. ; Nagpal, R. ; Shu, E. Y. ; Li, C. ; Qu, P. ; Chen, F. T.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.774-780,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. EUV mask pilot line at Intel Corporation (Keynote Address)
Stivers, A. R. ; Yan, P. -Y. ; Zhang, G. ; Shu, E. Y. ; Tejnil, E. ; Lieberman, B. ; Nagpal, R. ; Hsia, K. ; Penn, M. ; Lo, F. -C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.13-22,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567