1.

Conference Proceedings
Conference Proceedings
1. TaN-based EUV mask absorber etch study [6283-84]
Du, Y. ; Choi, J. C. ; Zhang, G. ; Park, -J. S. ; Yan, -Y. P. ; Baik, -H. K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62833D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. EUV mask pattern defect printability [6283-95]
Liang, T. ; Zhang, G. ; Naulleau, P. ; Myers, A. ; Park, -J. S. ; Stivers, A. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283