1.

Conference Proceedings
Conference Proceedings
1. Resist blur and line edge roughness (Invited Paper)
Zhang, G. ; Terry, M. ; O'Brien, S. ; Soper, R. ; Mason, M. ; Kim, W. ; Wang, C. ; Hansen, S. ; Lee, J. ; Ganeshan, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.38-52,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm [6349-70]
Mason, M. ; Best, S. ; Zhang, G. ; Terry, M. ; Soper, R.
Pub. info.: Photomask Technology 2006.  pp.63491X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349