1.

Conference Proceedings
Conference Proceedings
1. Post-OPC verification using a full-chip pattern-based simulation verification method [5992-100]
Yung, C. -Y. ; Wang, C. -H. ; Ma, C. ; Zhang, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922Z-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. A methodology to weight OPC modeling data plans [6283-72]
Hung, -Y. C. ; Wang, -H. C. ; Liu, Q. ; Ma, C. ; Wu, K. ; Zhang, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628331-628331,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283