1.

Conference Proceedings
Conference Proceedings
1. EUV mask process development and integration [6283-91]
Zhang, G. ; Yan, -Y. P. ; Liang, T. ; Du, Y. ; Sanchez, P. ; Park, S. ; Lanzendorf, J. E. ; Choi, J. C. ; Shu, Y. E. ; Stivers, R. A. ; Farnsworth, J. ; Hsia, K. ; Chandhok, M. ; Leeson, J. M. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. EUV mask pattern defect printability [6283-95]
Liang, T. ; Zhang, G. ; Naulleau, P. ; Myers, A. ; Park, -J. S. ; Stivers, A. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283