1.

Conference Proceedings
Conference Proceedings
1. Implementing flare compensation for EUV masks through localized mask CD resizing
Krautschik, C.G. ; Chandhok, M. ; Zhang, G. ; Lee, S.H. ; Goldstein, M. ; Panning, E.M. ; Rice, B.J. ; Bristol, R.L. ; Singh, V.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.58-68,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Lithographic evaluation of the EUV engineering test stand
Lee, S.H. ; Tichenor, D.A. ; Ballard, W.P. ; Bernardez, L.J, II. ; Goldsmith, J.E.M. ; Haney, S.J. ; Jefferson, K.L. ; Johnson, T.A. ; Leung, A.H. ; O'Connell, D.J. ; Replogle, W.C. ; Wronosky, J.B. ; Blaedel, K.L. ; Naulleau, P.P. ; Goldberg, K.A. ; Gullikson, E.M. ; Chapman, H.N. ; Wurm, S. ; Panning, E.M. ; Yan, P.-Y. ; Zhang, G. ; Bjorkholm, J.E. ; Kubiak, G.D. ; Sweeney, D.W. ; Attwood, D.T. ; Gwyn, C.W.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.266-276,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
3.

Conference Proceedings
Conference Proceedings
3. Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
Chandhok, M. ; Lee, S.H. ; Krautschik, C.G. ; Zhang, G. ; Rice, B.J. ; Goldstein, M. ; Panning, E. ; Bristol, R. ; Stivers, A.R. ; Shell, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.854-860,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374