1.

Conference Proceedings
Conference Proceedings
1. EUV mask pilot line at Intel Corporation (Keynote Address)
Stivers, A. R. ; Yan, P. -Y. ; Zhang, G. ; Shu, E. Y. ; Tejnil, E. ; Lieberman, B. ; Nagpal, R. ; Hsia, K. ; Penn, M. ; Lo, F. -C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.13-22,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. EUV mask process development and integration [6283-91]
Zhang, G. ; Yan, -Y. P. ; Liang, T. ; Du, Y. ; Sanchez, P. ; Park, S. ; Lanzendorf, J. E. ; Choi, J. C. ; Shu, Y. E. ; Stivers, R. A. ; Farnsworth, J. ; Hsia, K. ; Chandhok, M. ; Leeson, J. M. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283