1.

Conference Proceedings
Conference Proceedings
1. Resist blur and line edge roughness (Invited Paper)
Zhang, G. ; Terry, M. ; O'Brien, S. ; Soper, R. ; Mason, M. ; Kim, W. ; Wang, C. ; Hansen, S. ; Lee, J. ; Ganeshan, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.38-52,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Illumination source mapping and optimization with resist-based process metrics for low-k1 imaging
Zhang, G. ; Hansen, S.
Pub. info.: Optical Microlithography XVII.  pp.369-380,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
Wang, C.A. ; Zhang, G. ; DeMoor, S. ; Tan, C. ; Ilzhoefer, J. ; Atkinson, C. ; Wickman, C. ; Hansen, S. ; Geh, B. ; Flagello, D.G. ; Boehm, M.
Pub. info.: Optical Microlithography XVII.  pp.581-590,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377