1.

Conference Proceedings
Conference Proceedings
1. Resist blur and line edge roughness (Invited Paper)
Zhang, G. ; Terry, M. ; O'Brien, S. ; Soper, R. ; Mason, M. ; Kim, W. ; Wang, C. ; Hansen, S. ; Lee, J. ; Ganeshan, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.38-52,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Across wafer focus mapping and its applications in advanced technology nodes [6154-23]
Zhang, G. ; DeMoor, S. ; Jessen, S. ; He, Q. ; Yan, W. ; Chevacharoenkul, S. ; Vellanki, V. ; Reynolds, P. ; Ganeshan, J. ; Hauschild, J. ; Pieters, M.
Pub. info.: Optical Microlithography XIX.  pp.61540N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154