1.

Conference Proceedings
Conference Proceedings
1. Implementing flare compensation for EUV masks through localized mask CD resizing
Krautschik, C.G. ; Chandhok, M. ; Zhang, G. ; Lee, S.H. ; Goldstein, M. ; Panning, E.M. ; Rice, B.J. ; Bristol, R.L. ; Singh, V.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.58-68,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
Chandhok, M. ; Lee, S.H. ; Krautschik, C.G. ; Zhang, G. ; Rice, B.J. ; Goldstein, M. ; Panning, E. ; Bristol, R. ; Stivers, A.R. ; Shell, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.854-860,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
3.

Conference Proceedings
Conference Proceedings
3. EUV mask process development and integration [6283-91]
Zhang, G. ; Yan, -Y. P. ; Liang, T. ; Du, Y. ; Sanchez, P. ; Park, S. ; Lanzendorf, J. E. ; Choi, J. C. ; Shu, Y. E. ; Stivers, R. A. ; Farnsworth, J. ; Hsia, K. ; Chandhok, M. ; Leeson, J. M. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283