1.

Conference Proceedings
Conference Proceedings
1. Investigation of polarization effects on new mask materials
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.587-598,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Development and evaluation of an F2 laser for immersion interference lithography at 157 nm
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1269-1278,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Evaluation systems of F2 laser lithography materials
Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Sumitani, A. ; Sasaki, H. ; Higasikawa, I. ; Irie, S. ; Fujii, K. ; Itani, T. ; Nakano, H. ; Hata, H.
Pub. info.: Optical Microlithography XVII.  pp.1606-1615,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of outgassing from a fluorinated resist for 157-nm lithography
Irie, S. ; Fujii, K. ; Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Uchino, I. ; Sumitani, A. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.226-237,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376