1.

Conference Proceedings
Conference Proceedings
1. Influence of mask induced polarization effects on a pattern printability
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.576-586,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Current status of 157-nm lithography using a full-field scanner
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1260-1268,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. 157-nm chromeless phase lithography with extremely high numerical aperture
Watanabe, K. ; Hagiwara, T. ; Matsuura, S. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.537-544,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. 157-nm chromeless phase lithography for 45-nm SRAM gate
Suganaga, T. ; Watanabe, K. ; Matsuura, S. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.
Pub. info.: Optical Microlithography XVII.  pp.1616-1626,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377