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21 results

Conference Proceedings

1. The Effect of Several Kinds of Oils on the Oil Resistance Behavior of Polystyrenic Thermoplastic Vulcanizate

Tasaka, M. ; Tamura, A. ; Mori, R.

Pub. info.:	Conference proceedings at ANTEC '98 : plastics on my mind, Society of Plastics Engineers, Atlanta, Georgia, April 26-April 30, 1998. 3 pp.3196-3200, 1998. Brookfield Center, CT. Society of Plastics Engineers, Inc. (SPE)
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	44(3)

Conference Proceedings

2. L-Shaped Base Electrode with 0.5 μm Contact Width for High f max HBTs

Yanagihara, M. ; Sakai, H. ; Ota, Y. ; Tanabe, M. ; Tamura, A.

Pub. info.:	Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII). pp.408-415, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-21

Conference Proceedings

3. 0.1 μm AlGaAs/InGaAs HEMT Fabrication by UV-Lithography

Tanabe, M. ; Matsuno, T. ; Sakai, H. ; Yanagihara, M. ; Inoue, K. ; Tamura, A.

Pub. info.:	Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII). pp.416-422, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-21

Conference Proceedings

4. Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold- making as studied by dissolution rate monitor [6283-30]

Takeshi, K. ; Oono, K. ; Negishi, Y. ; Inokuchi, D. ; Tanaka, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831Z-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

5. Evaluation of bi-layer TaSix absorber on buffer for EUV mask [6349-125]

Kanayama, K. ; Tamura, S. ; Nishiyama, Y. ; Kawashita, M. ; Matsuo, T. ; Tamura, A. ; Nagashige, S. ; Hiruma, K. ; Goo, D. ; Nishiyama, I.

Pub. info.:	Photomask Technology 2006. pp.63493A-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

6. Resolution improvement of EPL stencil mask using thin membrane [6151-52]

Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H

Pub. info.:	Emerging Lithographic Technologies X. pp.61511F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

7. 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H. ; Eguchi, H. ; Yoshii, T. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.925-933, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. LEEPL mask fabrication using SOI substrates

Yotsui, K. ; Suzuki, G. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.942-950, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

9. Low-stress stencil masks using SOI substrates for EPL and LEEPL

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.879-887, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

10.

Conference Proceedings

10. Practical LEEPL masks for sub-65-nm node

Yotsui, K. ; Sumida, T. ; Negishi, Y. ; Yoshii, T. ; Tamura, A.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1268-1277, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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