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17 results

Conference Proceedings

1. First-Principles Analysis of Dissociative Absorption of HF Molecule at SiC Surface Step Edge

K. Inagaki ; B.V. Pho ; K. Yamauchi ; Y. Morikawa

Pub. info.:	Silicon carbide and related materials 2011 : selected, peer reviewed papers from the 14th International Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), September 11-16, 2011, Cleveland, Ohio, USA. pp.581-584, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	717-720

Conference Proceedings

2. Investigation of the Barrier Heights for Dissociative Adsorption of HF on SiC Surfaces in the Catalyst-Referred Etching Process

P.V. Bui ; K. Inagaki ; Y. Sano ; K. Yamauchi ; Y. Morikawa

Pub. info.:	Silicon carbide and related materials 2013 : selected, peer reviewed papers from the 15th International Conference on Silicon Carbide and Related Materials (ICSCRM 2013), September 29 - October 4, 2013, Miyazaki, Japan. pp.726-729, 2014. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	778-780

Conference Proceedings

3. Chemical Diffusion Coefficient of Lithium in Graphite Fiber

T. Uchida ; Y. Morikawa ; H. Ikuta ; M. Wakihara

Pub. info.:	Proceedings of the Symposium on New Sealed Rechargeable Batteries and Supercapacitors. pp.292-301, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-23

Technical Paper

4. Aerodynamics Evaluation of Road Vehicles in Dynamic Maneuvering

Y. Okada ; T. Nakashima ; M. Tsubokura ; Y. Morikawa ; R. Kouno

Pub. info.:	2016 SAE World Congress Exhibition : technical paper. 2016. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2016

Conference Proceedings

5. Analysis of diffraction orders including mask topography effects for OPC optimization

Y. Inazuki ; N. Toyama ; T. Adachi ; T. Nagai ; T. Suto ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

6. Pupil plane analysis on AIMS 45-193i for advanced photomasks

Y. Morikawa ; T. Sutou ; K. Mesuda ; T. Nagai ; Y. Inazuki ; T. Adachi ; N. Toyama ; H. Mohri ; N. Hayashi ; U. Stroessner ; R. Birkner ; R. Richter ; T. Scheruebl

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

7. Extendibility of single mask exposure for practical ArF immersion lithography

T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; N. Toyama ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

8. Approach to analyze decomposition impact for photomask fabrication

N. Toyama ; T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

9. Birefringence variation of quartz substrates during mask process

Y. Morikawa ; Y. Kitahata ; T. Yokoyama ; T. Kikuchi ; A. Kawaguchi ; Y. Ohkubo

Pub. info.:	EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6533

10.

Conference Proceedings

10. Characteristics optimization of mask materials for hyper-NA lithography

Y. Morikawa ; T. Suto ; T. Nagai ; Y. Inazuki ; T. Adachi ; Y. Kitahata ; T. Yokoyama ; N. Toyama ; H. Mohri ; N. Hayashi

Pub. info.:	EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6533

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Author: Y. Morikawa