1.

Conference Proceedings
Conference Proceedings
1. Application of charge-dispersing layer to reticle fabrication
Shirabe,K. ; Hoshino,E. ; Watanabe,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.37-41,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Bilevel resist process for 1-Gb DRAM reticles
Shirabe,K. ; Hoshino,E. ; Watanabe,K.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.12-21,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793