1.

Conference Proceedings

Conference Proceedings
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings

Conference Proceedings
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings

Conference Proceedings
Schenau,K.van Ingen ; Vleeming,B. ; Ansem,W.F.Gehoel-van ; Wong,P. ; Vandenberghe,G.N.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.200-210,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings

Conference Proceedings
Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.108-117,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
5.

Conference Proceedings

Conference Proceedings
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings

Conference Proceedings
Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.954-967,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
7.

Conference Proceedings

Conference Proceedings
Muckenhirn,S. ; Meyyappan,A. ; Walch,K. ; Maslow,M.J. ; Vandenberghe,G.N. ; Wingerden,J.Van
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.188-199,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
8.

Conference Proceedings

Conference Proceedings
Vandenberghe,G.N. ; Driessen,F. ; Adrichem,P.J.van ; Ronse,K. ; Li,J. ; Karklin,L.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.394-405,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562