1.

Conference Proceedings
Conference Proceedings
1. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Stray-light implementation in optical proximity correction (OPC)
Y. -C. Kim ; D. Kim ; I. Kim ; S. Kim ; S. Suh ; Y. -J. Chun ; S. Lee ; J. Lee ; C. -J. Kang ; J. Moon ; K. Taravade ; S. Lee
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. Merged contact OPC using pattern type specific modeling and correction
S. Suh ; S. Kim ; S. Lee ; Y. Kim ; J. Lee ; C. Kang
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607