1.

Conference Proceedings
Conference Proceedings
1. Effective exposure-dose measurement in optical microlithography
Inoue,S. ; Fujisawa,T. ; Izuha,K.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.810-818,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Measurement of effective source shift using a grating-pinhole mask
Sato,K. ; Tanaka,S. ; Fujisawa,T. ; Inoue,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.99-107,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679