1.

Conference Proceedings
Conference Proceedings
1. Mask substrate birefringence requirements for hyper-NA lithography [6154-159]
van de Kerkhof, M. ; de Boeij, W. ; Demarteau, M. ; Geh, B. ; Leunissen, L. H. A. ; Martin, P. ; Cangemi, M.
Pub. info.: Optical Microlithography XIX.  pp.615444-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging [5992-37]
Geh, B. ; Flagello, D. G. ; Pregler, C. ; Martin, P. M. ; Leunissen, L. H. A. ; Hansen, S. ; de Boeij, W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599210-599210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Interferometric-probe aberration monitors: aerial image and in-resist performance
Robins, G.C. ; Dusa, M. ; Geh, B. ; Neureuther, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.309-317,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. Effects of reticle reflectance on lithography
Cummings, K.D. ; Geh, B. ; Lu, B. ; Wasson, J.R. ; Weisbrod, E. ; Dauksher, W.J. ; Nordquist, K.J. ; Mangat, P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.256-265,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
Wang, C.A. ; Zhang, G. ; DeMoor, S. ; Tan, C. ; Ilzhoefer, J. ; Atkinson, C. ; Wickman, C. ; Hansen, S. ; Geh, B. ; Flagello, D.G. ; Boehm, M.
Pub. info.: Optical Microlithography XVII.  pp.581-590,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377