1.

Conference Proceedings
Conference Proceedings
1. The optimization of the soft bake step for the Low-k application using novel porous ladder-type HSQ
Cho, J.-H. ; Lee, J.-H. ; Choi, J.-S. ; Chon, S.-M.
Pub. info.: Nanoscale devices, materials, and biological systems : fundamentals and applications : proceedings of the international symposium.  pp.269-280,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-13
2.

Conference Proceedings
Conference Proceedings
2. Analysis of solvent effect to control the BARC coating uniformity
Jung, M.-H. ; Yoon, S. ; Chung, E.-S. ; Yoo, B.-S. ; Ya, J.Y. ; Winning, D. ; Kim, B.D. ; Lee, H. ; Kim, D.Y. ; Kim, Y.H. ; Kim, M. ; Chon, S.-M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.703-710,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Influence of activation energy on LER in chemically amplified KrF photoresists
Kim, J.H. ; Lee, C.H. ; Park, S.B. ; Kim, W.M. ; Moon, S.S. ; Kim, K.-M. ; Lee, S.Y. ; Yoon, S. ; Kim, Y.H. ; Chon, S.-M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.790-800,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Influence of resin properties to resist performance at ArF lithography
Yoon, S. ; Kim, M. ; Lee, H. ; Kim, D.Y. ; Kim, Y.H. ; Kim, B.D. ; Kim, J.H. ; Kim, K.-M. ; Lee, S.Y. ; Chon, S.-M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.583-590,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Impact of BARC on SEM shrinkage of ArF resist
Lee, S.Y. ; Kim, M. ; Yoon, S. ; Kim, K.-M. ; Kim, J.H. ; Kim, H.-W. ; Woo, S.-G. ; Kim, Y.H. ; Chon, S.-M. ; Kishioka, T. ; Sone, Y. ; Nakajima, Y.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.575-582,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376