1.

Conference Proceedings
Conference Proceedings
1. Analysis of precise CD control for 45nm node and beyond
Cheng, Y. F. ; Wu, T. H. ; Lin, C. L. ; Chang, S. Y. ; Lin, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.204-214,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]
Cheng, Y. F. ; Chou, Y. L. ; Yang, C. H.
Pub. info.: Optical Microlithography XIX.  pp.61542D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141]
Su, B. ; Verma, G. ; Wolk, W. ; Ahmadian, M. ; Du, H. ; Vikram, A. ; Andrews, S. ; Cheng, Y. F. ; Chou, Y. L. ; Yang, C. H. ; Lin, C.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599244-599244,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment [5992-92]
Cheng, Y. F. ; Chou, Y. L. ; Lin, C. L. ; Huang, P.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]
Hung, K. ; Cheng, Y. F. ; Sun, J. W. ; Lin, B. S. M. ; Fu, S. ; Dziura, T. G. ; Cusacovich, M. ; Mieher, W. D
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152