1.

Conference Proceedings
Conference Proceedings
1. Thermomechanical distortions of advanced optical reticles during exposure
Chang,J. ; Abdo,A. ; Kim,B. ; Bloomstein,T.M. ; Engelstad,R.L. ; Lovell,E.G. ; Beckman,W.A. ; Mitchell,J.W.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.756-767,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
2.

Conference Proceedings
Conference Proceedings
2. Thermomechanical distortions of ion-beam stencil masks during exposure
Lee,P.-T. ; Kim,B. ; Frisque,G.A. ; Tejeda,R.O. ; Engelstad,R.L. ; Lovell,E.G. ; Beckman,W.A. ; Mitchell,J.W.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.779-785,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. Localized resist heating due to electron-beam patterning during photomask fabrication
Wei,A.C. ; Beckman,W.A. ; Engelstad,R.L. ; Mitchell,J.W. ; Phung,T.N. ; Zheng,J.-F.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.482-493,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. Predicting thermomechanical distortions of optical reticles for 157-nm technology
Abdo,A.Y. ; Engelstad,R.L. ; Beckman,W.A. ; Mitchell,J.W. ; Lovell,E.G.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.724-732,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Experimental model verification of the thermal response of optical reticles
Abdo,A.Y. ; Reu,P.L. ; Schlax,M.P. ; Engelstad,R.L. ; Beckman,W.A. ; Mitchell,J.W. ; Lovell,E.G.
Pub. info.: Optical Microlithography XIV.  4346  pp.1478-1483,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346