1.

Conference Proceedings
Conference Proceedings
1. Lithographic metrics for the determination of intrinsic resolution limits in EUV resists
P. P. Naulleau ; C. N. Anderson ; B. L. Fontaine ; R. Kim ; T. Wallow
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
2.

Conference Proceedings
Conference Proceedings
2. Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography
C. S. Saravanan ; S. Nirmalgandhi ; O. Kritsun ; A. Acheta ; R. Sandberg ; B. L. Fontaine ; H. J. Levinson ; K. Lensing ; M. Dusa ; J. Hauschild ; A. Pici
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry
O. Kritsun ; B. L. Fontaine ; R. Sandberg ; A. Acheta ; H. J. Levinson ; K. Lensing ; M. Dusa ; J. Hauschild ; A. Pici ; C. Saravanan ; K. Primak ; R. Korlahalli ; S. Nirmalgandhi
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
4.

Conference Proceedings
Conference Proceedings
4. Characterization of photo-acid redeposition in 193-nm photoresists
T. Wallow ; M. Plat ; Z. Zhang ; B. MacDonald ; J. Bernard ; J. Romero ; B. L. Fontaine ; H. J. Levinson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
5.

Conference Proceedings
Conference Proceedings
5. Recent results from the Berkeley 0.3-NA EUV microfield exposure tool
P. P. Naulleau ; C. N. Anderson ; K. Dean ; P. Denham ; K. A. Goldberg ; B. Hoef ; B. L. Fontaine ; T. Wallow
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
6.

Conference Proceedings
Conference Proceedings
6. Initial experience establishing an EUV baseline lithography process for manufacturability assessment
O. R. Wood II ; D. Back ; R. Brainard ; G. Denbeaux ; D. Goldfarb ; F. Goodwin ; J. Hartley ; K. Kimmel ; C. Koay ; B. L. Fontaine ; J. Mackey ; B. Martinick ; W. Montgomery ; P. Naulleau ; U. Okoroanyanwu ; K. Petrillo ; B. Pierson ; M. Tittnich ; S. Trogisch ; T. Wallow ; Y. Wei
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
7.

Conference Proceedings
Conference Proceedings
7. Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer
T. Wallow ; A. Acheta ; Y. Ma ; A. Pawloski ; S. Bell ; B. Ward ; C. Tabery ; B. L. Fontaine ; R. Kim ; S. McGowan ; H. J. Levinson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519