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Conference Proceedings

1. Correlation of Local Strain in a TEM Sample and in the Bulk for a Recessed SiGe CMOS Structure

W. Zhao ; G. Duscher ; M. Zikry ; S. Chopra ; M. C. Öztürk ; G. Rozgonyi

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.23-30, 2007. Pennington, NJ. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	6(1)

Conference Proceedings

2. Integrating Selective Epitaxy in Advanced Logic & Memory Devices

S. Kuppurao ; Y. Kim ; Y. Cho ; S. Chopra ; Z. Ye

Pub. info.:	SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices. pp.415-425, 2008. Pennington, NJ. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	16(10)

Conference Proceedings

3. Heavily Phosphorus Doped Silicon Junctions for nMOS Applications

S. Chopra ; Z. Ye ; A. Zojaji ; Y. Kim ; S. Kuppurao

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.307-312, 2008. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	13(1)

Conference Proceedings

4. Structural nanoskin based on carbon nanosphere chains

V. N. Shanov ; G. Choi ; G. Maheshwari ; G. Seth ; S. Chopra ; G. Li ; Y. Yun ; J. Abot ; M. J. Schulz

Pub. info.:	Sensors and smart structures, technologies for civil, mechanical, and aerospace systems. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6529