Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

40 results

Conference Proceedings

1. Refractive index measurements of photoresist and antireflective coatings with variable-angle spectroscopic ellipsometry

Synowicki,R.A. ; Hilfiker,J.N. ; Dammel,R.R. ; Henderson,C.L.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.384-390, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Novel approach to surface imaging

Spak,M.A. ; Mohr,F. ; Bradbury,R. ; Dammel,R.R. ; Weigold,J.W. ; Pang,S.W.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1017-1023, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Improved simulation of photoresists using new development models

Dammel,R.R. ; Sagan,J.P. ; Kokinda,E. ; Eilbeck,N. ; Mack,C.A. ; Arthur,G.G. ; Henderson,C.L. ; Scheer,S.A. ; Rathsack,B.M. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.401-416, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Process effects resulting from conversion to a safe-solvent organic BARC

Cox,J.C. ; Welsh,L. ; Murphy,D. ; Eakin,R.J. ; Silvestre,P. ; Dammel,R.R. ; Ding,S. ; Williams,B. ; Khanna,D.N.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1040-1050, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

Padmanaban,M. ; Cook,M.M. ; Durham,D.L. ; Khanna,D.N. ; Klauck-Jacobs,A. ; Oberlander,J. ; Rahman,D. ; Dammel,R.R.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.234-244, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

6. Non-chemically amplified 248-nm resist materials

Willson,C.G. ; Yueh,W. ; Leeson,M.J. ; Steinhasler,T. ; McAdams,C.L. ; Dammel,R.R. ; Sounik,J.R. ; Aslam,M. ; Vicari,R. ; Sheehan,M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.226-237, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

7. Photoresist materials:a historical perspective

Willson,C.G. ; Dammel,R.R. ; Reiser,A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.28-41, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. Modeling parameter extraction for DNQ-novolak thick film resists

Henderson,C.L. ; Scheer,S.A. ; Tsiartas,P.C. ; Rathsack,B.M. ; Sagan,J.P. ; Dammel,R.R. ; Erdmann,A. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.256-267, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

9. Water-castable bottom antireflective coatings

Lu,P.-H. ; Mehtsun,S. ; Sagan,J.P. ; Dammel,R.R. ; McCulloch,I.A. ; Kang,M. ; Tanaka,H. ; Kimura,K.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.806-817, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

10.

Conference Proceedings

10. Optimizing image transfer into AZ BARLi bottom coat for submicron i-line lithography

Caligiore,A. ; Valtolina,M. ; Cipolli,A. ; Monguzzi,A. ; Mohr,F. ; Spak,M.A. ; Dammel,R.R.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1360-1364, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

40 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Dammel,R.R.