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54 results

Conference Proceedings

1. Effects of polymer structure on dissolution characteristics in chemically amplified 193-nm resists

Itani, T. ; Yoshino, H. ; Takizawa, M. ; Yamana, M. ; Tanabe, H. ; Kasama, K.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.306-315, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

2. Ultra-Shallow Junction Formation by Low Energy Ion Implantation and Flash Lamp Annealing*

Suguro, K. ; Ito, T. ; Itani, T. ; linuma, T.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.253-262, 2003. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-6

Conference Proceedings

3. Low-Temperature Synthesis of Plasma TEOS SiO2

Itani, T. ; Fukuyama, S.

Pub. info.:	Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.255-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	446

Conference Proceedings

4. Effects of O2 gas addition on diamond-like carbon film deposition

Nakamura, N. ; Itani, T. ; Chiba, H. ; Watanabe, K. ; Kurihara, K.

Pub. info.:	Amorphous and nanostructured carbon : sympoisum held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.. pp.415-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	593

Conference Proceedings

5. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists

Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.

Pub. info.:	Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.554-563, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5753(1)

Conference Proceedings

6. Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Kurose, E. ; Watanabe, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.603-614, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

7. 157-nm lithography with high numerical aperture lens for 70-nm technology node

Suganaga, T. ; Kanda, N. ; Kim, J.-H. ; Yamabe, O. ; Watanabe, K. ; Furukawa, T. ; Miyoshi, S. ; Itani, T. ; Cashmore, J.S. ; Gower, M.C.

Pub. info.:	Optical Microlithography XV. Part One pp.584-593, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

8. Selete activity of 157-nm lithography and masks

Yoshioka, N. ; Itani, T. ; Wakamiya, W.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.220-224, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

9. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1137-1145, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

10.

Conference Proceedings

10. Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Watanabe, K. ; Kurose, E. ; Suganaga, T. ; Itani, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.736-744, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

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Author: Itani, T.