1.

Conference Proceedings
Conference Proceedings
1. Rigorous EUV mask simulator using 2D and 3D waveguide methods
Zhu, Z. ; Lucas, K. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.494-503,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
Zhu, Z. ; Lucas, K.D. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.585-594,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256