Otaki, K. ; Zhu, Y. ; Ishii, M. ; Nakayama, S. ; Murakami, K. ; Gemma, T.
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Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA. pp.182-190, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Sugisaki, K. ; Okada, M. ; Zhu, Y. ; Otaki, K. ; Liu, Z. ; Kawakami, J. ; Ishii, M. ; Saito, J. ; Murakami, K. ; Hasegawa, M. ; Ouchi, C. ; Kato, S. ; Hasegawa, T. ; Suzuki, K. ; Yokota, H. ; Niibe, M. ; Takeda, M.
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Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA. pp.59210D-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Murakami, K. ; Saito, J. ; Ota, K. ; Kondo, H. ; Ishii, M. ; Kawakami, J. ; Oshino, T. ; Sugisaki, K. ; Zhu, Y. ; Hasegawa, M. ; Sekine, Y. ; Takeuchi, S. ; Ouchi, C. ; Kakuchi, O. ; Watanabe, Y. ; Hasegawa, T. ; Hara, S. ; Suzuki, A.
Pub. info.:
Emerging Lithographic Technologies VII. 1 pp.257-264, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering