1.

Conference Proceedings
Conference Proceedings
1. VARIATIONS IN THE PHOTOLUMINESCENCE INTENSITY OF CHEMICALLY AND ANODICALLY ETCHED SILICON FILMS
Williams, P.S. ; Kidder Jr., J.N. ; Yun, H. ; Crain, D. ; Pearsall, T.P. ; Schwartz, D.T.
Pub. info.: Silicon-based optoelectronic materials : Symposium held April 12-14, 1993, San Francisco, California, U.S.A..  pp.313-318,  1993.  Pittsburgh, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 298
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Conference Proceedings
Conference Proceedings
2. Developments in chlorine detection in concrete using NMR
Yun, H. ; Patton, M.E. ; Garrett, J.H., Jr. ; Fedder, G.K. ; Frederick, K.M. ; Hsu, J.-J. ; Lowe, I.J. ; Oppenheim, I.J. ; Sides, P.J.
Pub. info.: Smart structures and materials 2002 : smart systems for bridges, structures, and highways : 18-20 March 2002, San Diego, USA.  pp.310-321,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4696
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Conference Proceedings
Conference Proceedings
3. A method with exact phase-shifting values and its experimental techniques in shadow moire topography
Yun, H. ; Yun, D. ; Lei, Z.
Pub. info.: Optical design and testing II : 8-12 November 2004, Beijing, China.  pp.783-790,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5638
4.

Conference Proceedings
Conference Proceedings
4. A new finding about the coupled fringes of off-plane displacement and slope in shadow moire and its optical analysis
Yun, H. ; Yun, D.
Pub. info.: Optical design and testing II : 8-12 November 2004, Beijing, China.  pp.772-776,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5638
5.

Conference Proceedings
Conference Proceedings
5. Photomask lifetime issues in ArF lithography [5853-10]
Eschbach, F. ; Coon, P. ; Greenebaum, B. ; Mittal, A. ; Sanchez, P. ; Tanzil, D. ; Ng, G. ; Yun, H. ; Sengupta, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.74-82,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Alt-phase shift mask technology for 65nm logic applications [6154-22]
Chakravorty, K. K. ; Henrichs, S. ; Qiu, W. ; Chavez, J. L. ; Liu, Y.-P. ; Ghadiali, F. ; Yung, K. ; Wilcox, N. ; Silva, M. ; Ma, J. ; Wu, P. ; Irvine, B. ; Yun, H. ; Cheng, W H ; Farnsworth, J
Pub. info.: Optical Microlithography XIX.  pp.61540M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154