1.

Conference Proceedings
Conference Proceedings
1. Sources of line-width roughness for EUV resists
Cao, H.B. ; Yueh, W. ; Rice, B.J. ; Roberts, J. ; Bacuita, T. ; Chandhok, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.757-764,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Techniques for directly measuring the absorbance of photoresists at EUV wavelengths
Chandhok, M. ; Cao, H. ; Yueh, W. ; Gullikson, E.M. ; Brainard, R.L. ; Robertson, S.A.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.861-868,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
3.

Conference Proceedings
Conference Proceedings
3. Patterning capabilities of EUV resists
Yueh, W. ; Cao, H.B. ; Chandhok, M. ; Lee, S. ; Shumway, M. ; Bokor, J.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.434-442,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376