1.

Conference Proceedings
Conference Proceedings
1. Airborne contamination control for 157-nm lithography: influence of ammonia contamination
Matsui, H. ; Kitano, J. ; Yoshihara, K. ; Kawaguchi, E. ; Furukawa, T. ; Matsunaga, K. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1074-1081,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Critical dimension (CD) control in 157-nm lithography
Hori, S. ; Yoshihara, K. ; Kyoda, H. ; Matsui, H. ; Furukawa, T. ; Miyoshi, S. ; Kawaguchi, E. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1333-1342,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039